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Chemical Vapour Deposition Growth Processes on an Atomic Level - arsson K. 2022 PDF IOP Publishing Ltd BOOKS TECHNICAL SCIENCES
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Chemical Vapour Deposition Growth Processes on an Atomic Level
Author: arsson K.
Year: 2022
Pages: 415
Format: PDF
File size: 15,1 MB
Language: ENG



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Book Description: Chemical Vapour Deposition Growth Processes on an Atomic Level arsson K. 2022 Pages: 415 Genre: Science, Technology, Engineering, and Mathematics (STEM) Summary: Chemical vapour deposition (CVD) is a widely used technique for depositing thin films and other materials in various industries, including microelectronics, photovoltaics, and biomedical devices. This book delves into the atomic-level processes involved in CVD growth, providing readers with a comprehensive understanding of the technology and its potential for advancing material development.
Chemical Vapour Deposition Growth Processes on an Atomic vel arsson K. 2022 Pages: 415 Genre: Science, Technology, Engineering, and Mathematics (STEM) Summary: Chemical Vapour Deposition (CVD) - широко используемый метод осаждения тонких пленок и других материалов в различных отраслях, включая микроэлектронику, фотогальванику и биомедицинские устройства. Эта книга углубляется в процессы атомного уровня, связанные с ростом сердечно-сосудистых заболеваний, предоставляя читателям всестороннее понимание технологии и ее потенциала для продвижения материального развития.
Chemical Vapour Deposition Growth Processes on an Atomic vel arsson K. 2022 Pages: 415 Genre: Science, Technology, Engineering, and Mathematics (STEM) Resumen: Depósito de vapor químico (CVD) es un método ampliamente utilizado para depositar películas delgadas y otros materiales en una variedad de industrias, incluyendo microelectrónica, fotovoltaica y dispositivos biomédicos. Este libro profundiza en los procesos de nivel atómico relacionados con el crecimiento de las enfermedades cardiovasculares, proporcionando a los lectores una comprensión integral de la tecnología y su potencial para avanzar en el desarrollo material.
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原子レベル放射線上の化学蒸着成長プロセスK2022 Pages: 415 Genre: Science、 Technology、 Engineering、 and Mathematics (STEM) Summary: Chemical Vapour Deposition (CVD)-フィルムに沈殿する幅広い方法そしてマイクロエレクトロニクス、太陽電池および生物医学装置を含むさまざまな企業の他の材料。本書では、心血管疾患の発生に関わる原子レベルのプロセスについて考察し、この技術と物質開発を進める可能性についての包括的な理解を読者に提供します。

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